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Delineation of platinum thin films, requiring high-temperature deposition

Thompson, Margarita P. ; You, Ren ; Chang, Shih-Chia ; Auner, Gregory W. ; Mantese, Joseph V.

Sensors and actuators. A. Physical., 2002-10, Vol.101 (3), p.358-363 [同儕審閱期刊]

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Delineation of platinum thin films, requiring high-temperature deposition
著者: Thompson, Margarita P. ; You, Ren ; Chang, Shih-Chia ; Auner, Gregory W. ; Mantese, Joseph V.
主題: Applied sciences ; Cross-disciplinary physics: materials science; rheology ; Delineation ; Deposition by sputtering ; Electronics ; Exact sciences and technology ; High-temperature deposition ; Lift-off ; Lithography, masks and pattern transfer ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Microelectronic fabrication (materials and surfaces technology) ; Physics ; Platinum ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
所屬期刊: Sensors and actuators. A. Physical., 2002-10, Vol.101 (3), p.358-363
描述: Two lift-off methods were developed for patterning platinum films deposited at 400 °C via DC magnetron sputtering. Both methods are based upon the formation of multiple-layer metal lithography masks. Ti/Al and Cr/Al masks were fabricated such that the Ti or Cr layer overhangs the aluminum base layer. When using a Ti/Al lithography mask, the patterned platinum lines were broadened and the line resolution was low. Higher line resolution and cleaner line edges were obtained when a Cr/Al mask was used.
出版者: Lausanne: Elsevier B.V
語言: 英文
識別號: ISSN: 0924-4247
EISSN: 1873-3069
DOI: 10.1016/S0924-4247(02)00267-4
資源來源: Elsevier ScienceDirect Journals Complete

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Delineation of platinum thin films, requiring high-temperature deposition

Thompson, Margarita P. ; You, Ren ; Chang, Shih-Chia ; Auner, Gregory W. ; Mantese, Joseph V.

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